Customer Service.P7HM LE | Motherboards | ASUS Global
ASUS P7HM LE – motherboard – micro ATX – LGA Socket – H55 overview and full product specs on CNET. DVI-D port (for P7HM LE and P7HM LX only). This port is for any DVI-D compatible device. DVI-D can’t be converted to output RGB Signal to CRT and isn’t compatible with DVI-I. Oct 19, · P7HM LE. The following table shows the supported CPUs for this motherboard. If your motherboard BIOS version number is greater than the BIOS version listed above, then you will not need to flash your BIOS. However, if your BIOS version is smaller than the version listed above, then you will need to select and download the latest BIOS to.
P7h55-m le.ASUSTeK Computer Inc. -Support- CPU Support – P7HM LE
ASUS P7HM LE – motherboard – micro ATX – LGA Socket – H55 overview and full product specs on CNET. DVI-D port (for P7HM LE and P7HM LX only). This port is for any DVI-D compatible device. DVI-D can’t be converted to output RGB Signal to CRT and isn’t compatible with DVI-I. LGA Intel® Lynnfield / Clarkdale Processor Ready. This motherboard supports the latest Intel® Lynnfield and Clarkdale processors in LGA package, which has memory and PCI Express controller integrated to support 2-channel (4 DIMMs) DDR3 memory and 16 PCI Express lanes providing higher graphics ry: Intel-Platform.
ASUS P7H55-M LE – motherboard – micro ATX – LGA1156 Socket – H55 Specs
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Philips to help Mapper develop maskless lithography technology
Philips announces agreement with Dutch company Mapper Lithography to develop tools for maskless lithography. Under the agreement, Philips Enabling Technologies Group will build a production line using Mapper technology.
Founded last year, Mapper has set itself the challenging and ambitious task of developing a mask-free and fast enough technology for printing on substrates. Mapper plans to start using its technology at 45nm rates and below. Mapper technology is expected to be ready by late 2021 or early 2021. From the published technical details, it is known that 13,000 light sources will be used in the system. By the way, that’s why the company got the name Mapper (Multi-Aperture Pixel-by-Pixel Enhancement of Resolution).
The research findings and technical solutions behind the Mapper were presented this week at the 3BEAMS conference in Tampa, Florida, USA. Demonstrated prototype of a system using multiple light sources capable of producing elements ranging in size from 150 to 50 nm. In this case, the size of the optical part of the installation, which contains the same 13,000 lenses, is 26x10x20 cm. The installation works as follows: the lens creates 13,000 light spots between two conductive plates, to which a potential difference is applied. It must be assumed that as a result of the ionization of the substrate as a result of the photoeffect in the focused light beam, ions are accelerated towards the plates, leading to the appearance of a lithographic pattern. Spot size is currently 80nm on average. The developers hope that they will be able to reduce the spot size to 30 nm.
In conclusion, we note that in addition to Mapper, Canon, E-Beam, Leica Microsystems, as well as ASML (once a division of Philips) and Micronic Laser Systems are currently working on maskless lithography.